FIB Nanostructures.pdf

FIB Nanostructures

FIB Nanostructures reviews a range of methods, including milling, etching, deposition, and implantation, applied to manipulate structures at the nanoscale. Focused Ion Beam (FIB) is an important tool for manipulating the structure of materials at the nanoscale, and substantially extends the range of possible applications of nanofabrication. FIB techniques are widely used in the semiconductor industry and in materials research for deposition and ablation, including the fabrication of nanostructures such as nanowires, nanotubes, nanoneedles, graphene sheets, quantum dots, etc. The main objective of this book is to create a platform for knowledge sharing and dissemination of the latest advances in novel areas of FIB for nanostructures and related materials and devices, and to provide a comprehensive introduction to the field and directions for further research. Chapters written by leading scientists throughout the world create a fundamental bridge between focused ion beam and nanotechnology that is intended to stimulate readers interest in developing new types of nanostructures for application to semiconductor technology. These applications are increasingly important for the future development of materials science, energy technology, and electronic devices. The book can be recommended for physics, electrical engineering, and materials science departments as a reference on materials science and device design.

CoSi2 nanostructures by writing FIB ion beam … A mass separated focused ion beam (FIB) is a very useful tool to fabricate nanostructures by writing implantation within an ion beam synthesis process…

3319028731 ISBN
Englisch SPRACHE
FIB Nanostructures.pdf


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Laser synthesis and functionalization of nanostructures Patterned periodic nanostructures serve as building blocks in electronics [28 ], spintronics 29 , chemical catalysts 30 , plasmonic and photonic devices [31–33], and memory devi-ces [34–36]. Various efforts have been made to write nanostructures into well-defined configurations. Electron-beam lithography and helium-FIB processing represent